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사업분야

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SINOPRO-The Exclusive Agency In Korea
Product:
Copper Sputtering Target
Product No.:
SP1109
Element:
Cu
Purity:
4N, 5N, 6N
Shape:
Planar target, Rotary target
Maker:
XINK(CN)
Supplier:
SINOPRO-The Exclusive Agency In Korea

Products Process

Product Introduction

Copper is a chemical element with the symbol Cu (from Latin: cuprum) and atomic number 29. It is a soft, malleable, and ductile metal with very high thermal and electrical conductivity. A freshly exposed surface of pure copper has a pinkish-orange color. Copper is used as a conductor of heat and electricity, as a building material, and as a constituent of various metal alloys.Copper Sputtering Targets are produced by melting technology, it’s widely applied for semiconductor, decorative coating and advanced packing field.

 

We can produce copper sputtering targets with purity of 99.9%~99.9999%, and the lowest oxygen content can be <1ppm, mainly used for display screen and touch screen wiring and protective film, solar light absorbing layer, semiconductor wiring, etc. We can produce planar copper sputtering targets (maximum G8.5 generation),  and copper rotary targets, mainly for the touch screen industry. Since the grain of the high-purity copper is difficult to break, We can only process with very large deformation and control the growth of twins to achieve a fine and uniform microstructure, which ensures a lower erosion rate and sensitivity of the formation of particles during sputtering.

The picture below are two micrographs of our copper sputtering target, the average grain size<50μm>

 

 

The copper sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 4N high purity copper sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO.