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Gold is a chemical element with the symbol Au and atomic number 79, making it one of the higher atomic number elements that occur naturally. In its purest form, it is a bright, slightly reddish yellow, dense, soft, malleable, and ductile metal. Chemically, gold is a transition metal and a group 11 element. It is one of the least reactive chemical elements and is solid under standard conditions.
Gold sputtering targets is a very important materials of semiconductor, it’s used for depositing gold thin film on the surface of semiconductor chips, to form ohmic contact film, electrode or other films, it can form various metallic films system. Most of gold oxide film system can be used for manufacturing LED, microwave communication device, widely applied in spaceflight, aviation, semiconductor chips and Solar Cells.
Gold target for SEM
With the wide application of SEM in different disciplines, the source and types of samples are more and more. From the conductivity difference, it can be divided into conductive samples and non-conductive samples. Conductive samples can be directly observed, non-conductive samples such as Polymer materials, biomaterials, ceramic materials, etc. When a non-conducting sample is irradiated by an electron beam, the charge is continuously accumulated due to the inability of the excess electrons to be guided away, and the charging phenomenon occurs, thereby affecting incident electrons and secondary electrons. And the trajectories of backscattered electrons, which seriously affect the observation of the morphology.
The user can deposited a continuous conductive film on the surface of the sample. The sputtering target for SEM is generally gold target, platinum target, gold-palladium alloy target, so that the surface of the non-conductive sample has a good ground, so that the accumulated charge is guided away in time.
Spraying a conductive film on the surface of the sample not only increases its conductivity, but also reduces the charge, and the sprayed conductive film can protect the sample and reduce the radiation damage of the sample. At the same time, the conductive film reduces the penetration depth of the incident electron beam, increases the number of secondary electrons and backscattered electrons generated on the surface of the sample, and the structure of the surface and even the structure of low atomic number atoms can be observed, thus the contrast of the image is improved.