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SINOPRO-The Exclusive Agency In Korea
Product:
Germanium Sputtering Target
Product No.:
SP1112
Element:
Ge
Purity:
5N, 6N
Shape:
Planar
Maker:
XINK(CN)
Supplier:
SINOPRO-The Exclusive Agency In Korea

Products Process

Product Introduction

Germanium is a chemical element with the symbol Ge and atomic number 32. It is a lustrous, hard-brittle, grayish-white metalloid in the carbon group, chemically similar to its group neighbours silicon and tin. Pure germanium is a semiconductor with an appearance similar to elemental silicon. Like silicon, germanium naturally reacts and forms complexes with oxygen in nature.

 

 

Germanium sputtering targets are made of 5N germanium crystals, due to its wide transmission range in the infrared and opaqueness in the visible light regions, germanium sputtering targets are used for depositing germanium thin film on the optic of thermal imaging camera. Such optics are usually working in the 8 to 14 micron range for passive thermal imaging and for hot-spot detection in military, mobile night vision, and fire fighting applications. It’s also used in infrared spectroscopes and other optical equipment that require extremely sensitive infrared detectors.

But as germanium thin film has a very high refractive index (4.0), so it must be coated with a anti-reflection film.

 

Target Materials: Germanium Ge

Crystal structure: Monocrystalline, polycrystalline

Purity: 5N, 6N

Conduction Type: N type

Resistivity: 0.03-50Ω.cm

Refractive index (10um): 4.0026

Absorption coefficient (/cm): ≤ 0.03

Optical transmittance: 46%

Surface finish: Ra 1.6um

Round target size: Diameter ≤ 450mm, thickness ≥ 0.5mm

Rectangle target size: 205 x 205mm max

 

Below form is a typically Certificate of analysis for 5N high purity Germanium sputtering target.