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사업분야

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SINOPRO-The Exclusive Agency In Korea
Product:
Nickel Iron Sputtering Target
Product No.:
SP1115
Element:
Ni + Fe
Purity:
3N5, 4N
Shape:
Planar target
Maker:
XINK(CN)
Supplier:
SINOPRO-The Exclusive Agency In Korea

Products Process

 

Product Introduction

Nickel-iron NiFe is a alloy containing 20%-60% of nickel. The melting point of Nickel-iron NiFe is 1430-1480 degrees and the density is between 8.1-8.7g/cm3. Nickel-iron alloy is a low-frequency soft magnetic material with low coercivity and high magnetic permeability in a weak magnetic field. In the early time, Nickel-iron alloys were used for telephone communication. Later, a heat treatment process and vacuum smelting production method were introduced to improve the alloys properties . 

 

The Nickel-iron alloy containing Ni 78% has a permeability about 10~20 times higher than silicon steel in weak magnetic field. It is widely used in sensitive relays, magnetic shielding, telephone and radio transformers, precise AC and DC instrument, and current transformers. By adding elements such as molybdenum, manganese, cobalt, copper, and chromium to the nickel-iron alloy, a ternary or quaternary nickel-iron alloy having a larger initial permeability Ui and a maximum magnetic permeability Um can be obtained. 

  

The main raw material of the nickel-iron NiFe sputtering target produced by Xinkang is high-purity nickel and iron, melted under vacuum furnace. The purity can reach more than 3N5. If customers have special requirements, we can also mass produce high-purity nickel-iron target with purity of 4N. 

 

The picture below are two micrographs of our NiFe(80/20 Wt%) alloy sputtering target, the average grain size<100μm.

 

 

 

The NiFe sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. In addition, our company can also produce various nickel alloy targets, such as NiAl, NiCo, NiCu, NiV, NiW, NiCrSi and other alloy targets, special composition, dimension and grain size can be customized to meet your full requirement.Please contact us if you have any requirements. 

Below form is a typically Certificate of analysis for 3N5 high purity NiFe sputtering target.

The analytical methods used are: 1. Analysis of metal elements using ICP-OES; 2. Analysis of gas elements using LECO.