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Nickel Chromium Sputtering Target are used for depositing Nickel-chromium alloy resistive film by PVD technology, the Nickel chromium film has high resistivity, low temperature coefficient of resistance, high sensitivity coefficient and low temperature dependence. Because NiCr alloy resistive film is easy to prepare,and PVD coating process is mature, and coating layer performance is excellent. Therefore it is mainly used to deposit precision resistive films in hybrid integrated circuits, which can meet the performance requirements of resistive strain gauge sensitive films, and commonly used for preparing thin film resistance strain gauges.
In the PVD coating industry, Ni-Cr binary alloy targets and it’s films are widely used in surface-strengthened films such as abrasion resistance, abrasion reduction, heat and corrosion resistance, as well as low-emissivity glass, microelectronics, magnetic recording, semiconductors and film resistors and other high-end technology industries.
The picture below are two micrographs of our NiCr(80/20 wt%) alloy sputtering target, the average grain size＜100μm.
The NiCr sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process.
In addition, we can also produce various nickel alloy targets, such as NiAl, NiCo, NiCu, NiV, NiW, NiCrSi and other alloy targets,and can produce according to your different requirements of target composition, dimension and grain size. Please contact us if you have any requirements.
Below form is a typically Certificate of analysis for 3N5 high purity NiCr(80/20wt%)sputtering target.The analytical methods used are:
1. Analysis of metal elements using ICP-OES; 2. Analysis of gas elements using LECO.