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Titanium Aluminum Sputtering Targets are produced by HIP technology, widely used for tool coating and decorative coating.Comparing with melting technology, TiAl targets produced by HIP technology have more uniform micro-inner structure, smaller grain size, and suitable for various magnetron sputtering machines and ion plating machines. End user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
The tools coated by TiAlN thin films have higher feed speeds, better cutting performance, longer service life and higher metal removal rates can be achieved without difficulty.
Titanium Aluminum Sputtering Targets and arc cathodes also are also used for decorative coating, to coating golden brown and brownish black color films. End user can obtain good hardness, high brightness, corrosion and oxidation resistant color without discolor for a very long time. Our targets have already been qualified by many ender users, inculuding manufacturers of watch, sanitary ware, car mirrors, etc.
Xinkang produce TiAl 25/75, TiAl 30/70, TiAl 33/67, TiAl 40/60, TiAl 50/50, TiAl 75/25 at%d cathodes for decoration and tool coating,The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our Titanium Aluminum (30/70 at%)sputtering target, the average grain size＜100μm